Passivation structure for flash memory and method for fabricating same

摘要

A passivation structure for a semiconductor device includes a high ultraviolet transmittance silicon nitride (UV-SiN) layer. This UV-SiN layer substantially conformally overlies a plurality of top metal lines, which are formed over a semiconductor substrate, such that topographical hollows are defined between adjacent top metal lines. A spin-on glass (SOG) material fills in the topographical hollows. A silicon oxynitride (SiON) layer having a thickness in a range from about 8,000 angstroms to about 10,000 angstroms overlies the UV-SiN layer and the SOG material. A method for forming the passivation structure also is described.