发明名称 |
Method, system and product for producing a reflective mask mirror and for ablating an object using said reflective mask mirror |
摘要 |
There is provided a system and method for ablating a surface of a work-piece comprising a radiation source for providing an ablating beam and a plurality of adjustable reflective masks having predetermined mask patterns thereon. The reflective masks are sequentially positioned relative to said radiation source and in the path of said ablating beam for reflecting said ablating beam onto the surface of the work-piece to ablate the work-piece.
|
申请公布号 |
US6657157(B1) |
申请公布日期 |
2003.12.02 |
申请号 |
US20000589310 |
申请日期 |
2000.06.07 |
申请人 |
WESTAR PHOTONICS, INC. |
发明人 |
ALTMAN ZINO;POLKOWSKI EDWARD;BRANDINGER JAY;HOFFMAN BRIAN |
分类号 |
B23K26/06;(IPC1-7):B23K26/00;B23K26/02 |
主分类号 |
B23K26/06 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|