发明名称 |
Method of etching, as well as frame element, mask and prefabricated substrate element for use in such etching |
摘要 |
In a method of etching a substrate having a surface layer of conductive material, a circuit pattern is transferred to the surface layer in a central surface area portion of the substrate by electrochemical etching. To prevent excessive current densities from forming at the periphery of the central surface area portion during the etching step, a frame adapted to attract electrical field is provided adjacent to the central surface area portion. The frame can be part of a separate frame element which is placed on the substrate before the etching step, or be incorporated in a resist coating on the substrate. The frame can be transferred to the resist coating by any suitable means, for example by photolithographic exposure through a mask with a suitable frame pattern. Alternatively, the frame can be incorporated in a prefabricated substrate element, to which the circuit pattern is transferred in the etching step. |
申请公布号 |
US6656341(B2) |
申请公布日期 |
2003.12.02 |
申请号 |
US20010954014 |
申请日期 |
2001.09.18 |
申请人 |
OBDUCAT AKTIEBOLAG |
发明人 |
PETERSSON PER;GUSTAVSSON MIKAEL;SJOEBERG JENNY;XIE BIN;BJARNASON BJARNI;BIERINGS GUST;FRENNESSON GOERAN |
分类号 |
C25F;C25F3/02;C25F3/14;H01L21/3063;H01L21/308;H05K3/07;(IPC1-7):C25F3/00;C25D17/00;C25B9/00;G03C1/725 |
主分类号 |
C25F |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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