发明名称 Formation of single-crystal silicon carbide
摘要 Device for forming a single crystal of a non-congruent evaporation compound body (e.g. silicon carbide), which is able to exist in mono- or poly-crystalline form, comprises: a substrate (42) between two superposed cylindrical compartments (20, 14); a single crystal seed (46) at the top of the first compartment, gas precursor inlet (36); and an inductive heater (26). Device for the formation of a single crystal of a non-congruent evaporation compound body (namely, silicon carbide) able to exist in monocrystalline or polycrystalline form comprises: a first compartment (20) containing a substrate (42) in which is formed a polycrystalline source of the body and a single crystal seed (46) of the body; a second compartment (14), the substrate being located between the two compartments; an inlet (36) for gas precursors in the second compartment to cause deposition of the body in polycrystalline form on the substrate; and a heater (26) to maintain the substrate at a temperature above the temperature of the seed to cause sublimation of the polycrystalline source and deposition of the body in a single crystal form on the seed. An Independent claim is given for a process for forming a single crystal of a non-congruent evaporation compound body able to exist in monocrystalline or polycrystalline form.
申请公布号 AU2003263226(A8) 申请公布日期 2003.12.02
申请号 AU20030263226 申请日期 2003.05.15
申请人 INSTITUT NATIONAL POLYTECHNIQUE DE GRENOBLE;NOVASIC;CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE 发明人 FRANCIS BAILLET;LUDOVIC CHARPENTIER;ETIENNE PERNOT;DIDIER CHAUSSENDE;DANIEL M. TUROVER;ROLAND MADAR;MICHEL PONS
分类号 C30B23/00;C30B23/02 主分类号 C30B23/00
代理机构 代理人
主权项
地址