发明名称 COPPER-NICKEL-SILICON TWO PHASE QUENCH SUBSTRATE
摘要 <p>A copper-nickel-silicon quench substrate rapidly solidifies molten alloy into microcrystalline or amorphous strip. The substrate is composed of a thermally conducting alloy. It has a two-phase microstructure with copper rich regions surrounded by a network of nickel silicide phases. The microstructure is substantially homogeneous. Casting of strip is accomplished with minimal surface degradation as a function of casting time. The quantity of material cast during each run is improved without the toxicity encountered with copper-beryllium substrates.</p>
申请公布号 AU2003233567(A1) 申请公布日期 2003.12.02
申请号 AU20030233567 申请日期 2003.05.15
申请人 HONEYWELL INTERNATIONAL INC. 发明人 SHINYA MYOJIN;RICHARD, L. BYE;GARY, B., A. SCHUSTER;DALE, R. WALLS;JOSEPH, G. COX;DAVID, W. MILLURE;JENG, S. LIN;NICHOLAS, J. DECRISTOFARO
分类号 B21J1/04;B21J5/00;B22D11/06;B22D21/00;C22C9/06;C22F1/00;C22F1/08;(IPC1-7):C22C9/06 主分类号 B21J1/04
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