发明名称 |
Method and apparatus for reducing compressed dry air usage during chemical mechanical planarization |
摘要 |
A retaining ring is provided. The retaining ring includes a lower annular sleeve having a base. The base has an inner sidewall and an outer sidewall extending therefrom. The lower annular sleeve has at least one hole defined therein. An upper annular sleeve is moveably disposed over the lower annular sleeve. The upper annular sleeve has a top, that has at least one hole defined therein. The top has an inner sidewall and an outer sidewall extending therefrom. A method for reducing a consumption of compressed dry air (CDA) during a chemical mechanical planarization (CMP) operation is also described.
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申请公布号 |
US6656024(B1) |
申请公布日期 |
2003.12.02 |
申请号 |
US20010029742 |
申请日期 |
2001.12.21 |
申请人 |
LAM RESEARCH CORPORATION |
发明人 |
BOYD JOHN M.;WEI DAVID;GOTKIS YEHIEL |
分类号 |
B24B21/04;B24B37/04;(IPC1-7):B24B5/00 |
主分类号 |
B24B21/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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