PHOTOSENSITIVE POLYMER AND RESIST COMPOSITION CONTAINING THE SAME

摘要

PURPOSE: Provided are a photosensitive polymer having a glass transition temperature capable of obtaining annealing effect in baking and a resist composition containing the photosensitive polymer, which is suitable to an exposure source of short wavelength being less than 193nm. CONSTITUTION: The photosensitive polymer comprises vinyl oxy alkyl adamantane carboxylate monomer(formula 1) and has a weight average molecular weight of 3,000-50,000. The photosensitive polymer is produced by polymerizing the vinyl oxy alkyl adamantane carboxylate monomer, maleic anhydride, and at least one monomer selected from the group consisting of (meth)acrylate, and norbornene derivative monomer. And the resist composition comprises the photosensitive polymer and 1-15wt%(based on the weight of the photosensitive polymer) of a photoacid generator(PAG). In the formula, X is an integer of 2-6.