| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a photomask blank and a glass substrate for photomask blank capable of producing a photomask having high pattern precision, and the photomask. <P>SOLUTION: The uneven cross-sectional shape of a main surface 1 of the photomask blank is formed to be a plane nearly parallel to a reference plane 2 which is nearly parallel to the main surface or a curved surface which is simply projected or recessed. <P>COPYRIGHT: (C)2004,JPO</p> |
