| 摘要 |
PROBLEM TO BE SOLVED: To provide a removing liquid composition for an alkali developing type acrylic negative photoresist, the composition showing excellent removing performance for a thick alkali developing type acrylic negative photoresist, excellent low temperature stability, and excellent characteristics and a property relating to environmental pollution. SOLUTION: The removing liquid composition for an alkali developing type acrylic negative photoresist contains 60 to 95 wt.% N-methylpyrolidone, 1 to 20 wt.% diethanolamine and/or triethanolamine, 0.1 to 5 wt.% tetra(substituted) alkylammonium hydroxide and 0.5 to 20 wt.% water. COPYRIGHT: (C)2004,JPO |
