| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an inspection method for inspecting a dot-shape defect, a line shape defect, a defect in unevenness of luminance and the like in the stage of an active matrix substrate. <P>SOLUTION: The subject of inspection is the active matrix substrate which has a plurality of pixels 20 each of which is connected to each one line of a plurality of scanning lines 10 and a plurality of signal lines 14, and a common pixel electrode 26 where pixel electrodes 22 which are to be formed individually in each of the plurality of pixels 20 are continuously formed over pixels of two or more and which is in halfway of working. This inspection method has a process for detecting currents which are made to flow through each of the plurality of the pixels 20 respectively by being in contact with common pixel electrode 26 of this active matrix substrate and a process for discriminating defects of the plurality of the pixels 20 on the basis of the detected currents. <P>COPYRIGHT: (C)2004,JPO</p> |
