| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having high transpar ency to a radiation, ensuring few development defects and excellent in basic physical properties as a resist, such as sensitivity, resolution and pattern shape. <P>SOLUTION: The radiation-sensitive resin composition comprises (A) a radiation-sensitive acid generator typified by bis(4-t-butylphenyl)iodonium 2-(bicyclo[2.2.1]heptan-2-yl)-1,1,2,2-tetrafluoroethanesulfonate or N-[2-(bicyclo[2.2.1]heptan-2-yl)-1,1,2,2- tetrafluoroethanesulfonyloxy]bicyclo[2.2.1]hept-5-ene-2,3-dicarboximide and (B) resin which becomes alkali-soluble by the action of acid and is typified by resin having a repeating unit derived from t-butyl bicyclo[2.2.1]hept-2-ene-5- carboxylate and/or 2-methyladamantan-2-yl (meth)acrylate. <P>COPYRIGHT: (C)2004,JPO |
