发明名称 |
SUBSTRATE HOLDER FOR MANUFACTURING CHEMICAL COMPOUND SEMICONDUCTOR |
摘要 |
PROBLEM TO BE SOLVED: To provide a substrate holder for manufacturing a chemical compound semiconductor capable of repeating film-forming continuously, with no warping due to thermal strain even if a compound semiconductor film sticks to the surface. SOLUTION: A substrate holder 10 for manufacturing a chemical compound semiconductor comprises on its surface a substrate holding recess 12 that holds a compound semiconductor crystal substrate 13 and is heated by the heat from a heater provided on a rear side. A plurality of deformation preventing grooves 15 are formed at a part of the surface of the substrate holder except for the substrate holding recess. COPYRIGHT: (C)2004,JPO |
申请公布号 |
JP2003338462(A) |
申请公布日期 |
2003.11.28 |
申请号 |
JP20020145955 |
申请日期 |
2002.05.21 |
申请人 |
NIPPON SANSO CORP |
发明人 |
UBUKATA EITOKU;TOKUNAGA HIROKI |
分类号 |
H01L21/683;H01L21/02;H01L21/205;H01L21/68;(IPC1-7):H01L21/205 |
主分类号 |
H01L21/683 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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