发明名称 SUBSTRATE HOLDER FOR MANUFACTURING CHEMICAL COMPOUND SEMICONDUCTOR
摘要 PROBLEM TO BE SOLVED: To provide a substrate holder for manufacturing a chemical compound semiconductor capable of repeating film-forming continuously, with no warping due to thermal strain even if a compound semiconductor film sticks to the surface. SOLUTION: A substrate holder 10 for manufacturing a chemical compound semiconductor comprises on its surface a substrate holding recess 12 that holds a compound semiconductor crystal substrate 13 and is heated by the heat from a heater provided on a rear side. A plurality of deformation preventing grooves 15 are formed at a part of the surface of the substrate holder except for the substrate holding recess. COPYRIGHT: (C)2004,JPO
申请公布号 JP2003338462(A) 申请公布日期 2003.11.28
申请号 JP20020145955 申请日期 2002.05.21
申请人 NIPPON SANSO CORP 发明人 UBUKATA EITOKU;TOKUNAGA HIROKI
分类号 H01L21/683;H01L21/02;H01L21/205;H01L21/68;(IPC1-7):H01L21/205 主分类号 H01L21/683
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