| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a chemically amplified positive resist composition which has a high sensitivity to an energy ray, does not suffer from resist pattern narrowing or shape deformation into a T-shape of the surface of the resist pattern with the lapse of time from exposure to a heat treatment, and is excellent in pattern-forming properties near the substrate and suitable for ArF exposure, a pattern-forming method and a pattern. <P>SOLUTION: An acid-generating agent is comprised of a sulfonium cation represented by general formula (1) (wherein R<SP>1</SP>is a benzyl group or the like; and R<SP>2</SP>and R<SP>3</SP>are each an alkyl group or the like) and a sulfonate anion represented by general formula (2): R<SP>4</SP>SO<SB>3</SB><SP>-</SP>(wherein R<SP>4</SP>is an alkyl group or the like). <P>COPYRIGHT: (C)2004,JPO |
