| 摘要 |
1,231,644. Etching. WESTERN ELECTRIC CO. Inc. 16 May, 1968 [19 May, 1967], No. 23217/68. Heading B6J. [Also in Division G2] A germanium support coated with a silicon dioxide layer and an exposed and developed resist (see Division G2) is etched with an aqueous solution containing ammonium fluoride and hydrofluoric acid which etches the silicon dioxide at 500 Š per minute.
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