METHOD FOR REMOVING RESIST USING FUNCTIONAL WATER AND APPARATUS THEREFOR

摘要

PROBLEM TO BE SOLVED: To provide a method for treating a resist excellent in washing cost and environmental preservation and ensuring very high removing power and to provide an apparatus therefor. SOLUTION: The method for removing a resist using functional water comprises (1) a step for irradiating a resist coated substrate with vacuum ultraviolet light of 172±10 nm wavelength, (2) a step for nearly uniformly coating the resist surface with functional water and (3) a step for irradiating the functional water with ultraviolet light of 190-310 nm wavelength. COPYRIGHT: (C)2004,JPO