| 摘要 |
PROBLEM TO BE SOLVED: To improve the cleaning efficiency by efficiently cleaning in a short time even when the used amount of the treating solution, readily evaporated or degassed, is small. SOLUTION: A substrate treating device is provided with a substrate base 2 for supporting a substrate 1, a shield plate 3 arranged while keeping a given interval with the substrate 1 mounted on the substrate base 2, and a pipe 5 for discharging the treating solution 4 readily evaporated or degassed onto the substrate 1 from the lower surface of the shield plate 3. COPYRIGHT: (C)2004,JPO |
