| 摘要 |
<p>An adapter assembly (130) is provided for supporting a sputtering cathode (14) in a fixed opening (15) in the chamber of a sputter coating machine (10). The assembly includes: one of several adapter bodies (32), each configured to support, in the fixed opening (15), a target (11) of one of a plurality of sizes and types, and at one of several target-to-substrate spacings; one of several insulator rings (36), each for a target of a different size or type; one of several dark-space shields (40), each for a target of a different size, type, material, or processing pressure; and one of several adapter shields (41), each for a different adapter body (32) and target material. Only the shields (40, 41) accumulate deposits and require cleaning or replacement. The dark-space shield (40) is spaced from the target rim by a gap of at 0.045 to 0.067 inches to form a deep narrow space (49) that prevents deposits onto the insulator ring (36) while avoiding arcing and plasma formation in the gap (49). A method is provided for existing sputtering machines (10) with the assembly (30), which accommodates different targets (11) and processes.</p> |
