| 摘要 |
<p>A method for producing a cerium-based polishing material having a step of pulverizing a raw material for a cerium-based polishing material, a step of firing the pulverized raw material, and a step of subjecting the fired raw material to a wet treatment, characterized in that it further comprises, after the wet treatment, a low temperature refiring step of heating the wet treated raw material at 200 to 700 °C. A polishing material having particularly preferred characteristics can be produced by a method still further comprising a step of fully drying the raw material after the wet treatment and subjecting the dried raw material to the low temperature refiring step.</p> |
