发明名称 METHOD OF INSPECTING METAL FILM MACHINING RESIDUE, INSPECTION APPARATUS AND PROCESS FOR PRODUCING THIN-FILM DEVICE
摘要 <p>A method of inspecting metal film machining residue, comprising exposing a sample composed of a mix of optically transparent thin-film and metal film to white light or monochromatic light, detecting the light reflected by the sample as a result of the exposure to white light or monochromatic light and examining the presence of metal film machining residue after metal film planarizing operation on the basis of the reflection intensity or reflectance of detected reflected light; and a process for producing a thin-film device wherein the metal film is planarized in accordance with the inspection results.</p>
申请公布号 WO2003098674(P1) 申请公布日期 2003.11.27
申请号 JP2003006351 申请日期 2003.05.21
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