发明名称 INTEGRATED CIRCUIT WITH REVERSE ENGINEERING PROTECTION
摘要 Technique and structures for camouflaging an integrated circuit structure. The integrated circuit structure is formed by a plurality of layers of material having controlled outlines and controlled thicknesses. A layer of dielectric material of a controlled thickness is disposed among said plurality of layers to thereby render the integrated circuit structure intentionally inoperable.
申请公布号 WO03098692(A1) 申请公布日期 2003.11.27
申请号 WO2003US14058 申请日期 2003.05.06
申请人 HRL LABORATORIES, LLC;CHOW, LAP-WAI;CLARK, JR., WILLIAM, M.;BAUKUS, JAMES, P. 发明人 CHOW, LAP-WAI;CLARK, JR., WILLIAM, M.;BAUKUS, JAMES, P.
分类号 H01L21/331;H01L21/822;H01L21/8238;H01L21/8247;H01L23/58;H01L27/02;H01L27/04;H01L27/092;H01L27/115;H01L29/732;H01L29/78;H01L29/788;H01L29/792 主分类号 H01L21/331
代理机构 代理人
主权项
地址