INTEGRATED CIRCUIT WITH REVERSE ENGINEERING PROTECTION
摘要
Technique and structures for camouflaging an integrated circuit structure. The integrated circuit structure is formed by a plurality of layers of material having controlled outlines and controlled thicknesses. A layer of dielectric material of a controlled thickness is disposed among said plurality of layers to thereby render the integrated circuit structure intentionally inoperable.
申请公布号
WO03098692(A1)
申请公布日期
2003.11.27
申请号
WO2003US14058
申请日期
2003.05.06
申请人
HRL LABORATORIES, LLC;CHOW, LAP-WAI;CLARK, JR., WILLIAM, M.;BAUKUS, JAMES, P.
发明人
CHOW, LAP-WAI;CLARK, JR., WILLIAM, M.;BAUKUS, JAMES, P.