发明名称 Surface protecting adhesive film for semiconductor wafer and processing method for semiconductor wafer using said adhesive film
摘要 An adhesive film for protecting the surface of a semiconductor wafer wherein the adhesive layer is formed on one surface of a substrate film, the substrate film comprising at least one layer which satisfies the following requisites (A) and at least one of (B) or (C): requisite(A): high elastic modulus properties in which the storage modulus is 1x10<9 >Pa to 1x10<10 >Pa under the total temperature range of from 18 to 50° C. requisite(B): high elastic modulus properties in which the storage modulus within at least part of the temperature range of from 50 to 90° C. is not more than 1x10<8 >Pa. requisite(C): high elastic modulus properties with expansibility by water absorption in which the size-changing ratio by absorbing water for four hours is 0.05 to 0.5% at 23° C. and 90% RH.
申请公布号 US2003219960(A1) 申请公布日期 2003.11.27
申请号 US20030339344 申请日期 2003.01.10
申请人 MITSUI CHEMICALS, INC. 发明人 FUKUMOTO HIDEKI;KOSHIMIZU TAKANOBU;KATAOKA MAKOTO;SAIMOTO YOSHIHISA
分类号 C09J7/02;H01L21/68;(IPC1-7):H01L21/30;H01L21/46 主分类号 C09J7/02
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