发明名称 |
Surface protecting adhesive film for semiconductor wafer and processing method for semiconductor wafer using said adhesive film |
摘要 |
An adhesive film for protecting the surface of a semiconductor wafer wherein the adhesive layer is formed on one surface of a substrate film, the substrate film comprising at least one layer which satisfies the following requisites (A) and at least one of (B) or (C): requisite(A): high elastic modulus properties in which the storage modulus is 1x10<9 >Pa to 1x10<10 >Pa under the total temperature range of from 18 to 50° C. requisite(B): high elastic modulus properties in which the storage modulus within at least part of the temperature range of from 50 to 90° C. is not more than 1x10<8 >Pa. requisite(C): high elastic modulus properties with expansibility by water absorption in which the size-changing ratio by absorbing water for four hours is 0.05 to 0.5% at 23° C. and 90% RH.
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申请公布号 |
US2003219960(A1) |
申请公布日期 |
2003.11.27 |
申请号 |
US20030339344 |
申请日期 |
2003.01.10 |
申请人 |
MITSUI CHEMICALS, INC. |
发明人 |
FUKUMOTO HIDEKI;KOSHIMIZU TAKANOBU;KATAOKA MAKOTO;SAIMOTO YOSHIHISA |
分类号 |
C09J7/02;H01L21/68;(IPC1-7):H01L21/30;H01L21/46 |
主分类号 |
C09J7/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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