发明名称 APPARATUS, SYSTEM AND METHOD TO REDUCE WAFER WARPAGE
摘要 <p>Typically, the frontside of a wafer is protected by a tape during backgrinding. Electrostatic charge may accumulate on the tape during the backgrinding operation. The wafer may warp after the backgrinding operation because the thinned wafer is not sufficiently rigid to counteract the bending forces resulting from the accumulation of electrostatic charge. In order to reduce wafer warpage, ionized air may be directed onto the wafer and tape to reduce the accumulation of electrostatic charge.</p>
申请公布号 WO2003098675(P1) 申请公布日期 2003.11.27
申请号 US2003013195 申请日期 2003.04.28
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