| 摘要 |
The invention relates to a thermoelectric element comprising at least one n-type layer (1) and at least one p-type layer (2) of one or more doped semiconductors, whereby the n-type layer(s) (2) are arranged to form at least one pn-type junction (3). At least one n-type layer (1) and at least one p-type (2) are contacted in an electrically selective manner, and a temperature gradient (T1, T2) is applied or tapped parallel (x-direction) to the boundary layer (3) between at least one n-type layer (1) and p-type layer (2). At least one pn-type junction is formed essentially along the entire, preferably longest, extension of the n-type layer(s) (1) and of the p-type layer(s) (2) and thus essentially along the entire boundary layer (3) thereof. |
