SINGLE WAFER FABRICATION OF INTEGRATED MICRO-FLUIDIC SYSTEM

摘要

Formation of micro-fluidic systems is normally achieved using a multi-wafer fabrication procedure. The present invention teaches how a complete micro-fluidic system can be implemented on a single chip. The invention uses only dry etch processes to form micro-chambers. In particular, it makes use of deep reactive ion etching whereby multiple trenches of differing depths may be formed simultaneously. Buried micro-chambers are formed by isotropically increasing trench widths using an etchant that does not attack the mask so the trenches grow wider beneath the surface until they merge. Deposition of a dielectric layer over the trenches allows some trenches to be sealed and some to be left open. Micro-pumps are formed by including in the micro-chamber roof a layer that is used to change chamber volume either through electrostatically induced motion or through thermal mismatch as a result of its being heated.