SRAM cell with reduced standby leakage current and method for forming the same

摘要

An SRAM cell within a semiconductor device includes p-channel transistors with increased threshold voltages to suppress standby leakage current in the SRAM cell. Existing processing operations already being used to form the semiconductor device, are used to produce the SRAM p-channel devices to have higher threshold voltages than logic p-channel devices also included within the semiconductor device. The processing operations used to form thicker gate oxides for transistors in the I/O portion of the same semiconductor device, may be used to form increased gate oxide thicknesses within the SRAM p-channel transistors. The SRAM p-channel transistors may include a gate oxide that is thicker than the gate oxides of the SRAM n-channel transistors and the logic p-channel transistors. In another embodiment, the gates of the SRAM p-channel transistors may be counterdoped with n-type impurities to produce an effectively greater gate oxide thickness due to poly depletion.