发明名称 |
Process for the production of a wiping material for a vacuum chamber |
摘要 |
The present invention provides a wiping material for a vacuum chamber having sufficient sludge wiping properties and water retention attained by easy control over cell diameter and use of a polyurethane foam which has been foamed free from a silicone-based surface active agent and a process for the production thereof. A wiping material made of a polyurethane foam for a vacuum chamber for use in the preparation of a silicon wafer is described, wherein the polyurethane foam is free of silicone and has an open-cell structure comprising cells the diameter of which are controlled to fall within the range of from 500 mum to 3,000 mum.
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申请公布号 |
US6652787(B2) |
申请公布日期 |
2003.11.25 |
申请号 |
US20010891173 |
申请日期 |
2001.06.26 |
申请人 |
INOAC CORPORATION;INOAC TECHNICAL CENTER |
发明人 |
SATO YUKIO |
分类号 |
A47L13/16;B08B1/00;C08G18/10;C08G101/00;C08J9/00;(IPC1-7):B29C44/02 |
主分类号 |
A47L13/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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