发明名称 Process for the production of a wiping material for a vacuum chamber
摘要 The present invention provides a wiping material for a vacuum chamber having sufficient sludge wiping properties and water retention attained by easy control over cell diameter and use of a polyurethane foam which has been foamed free from a silicone-based surface active agent and a process for the production thereof. A wiping material made of a polyurethane foam for a vacuum chamber for use in the preparation of a silicon wafer is described, wherein the polyurethane foam is free of silicone and has an open-cell structure comprising cells the diameter of which are controlled to fall within the range of from 500 mum to 3,000 mum.
申请公布号 US6652787(B2) 申请公布日期 2003.11.25
申请号 US20010891173 申请日期 2001.06.26
申请人 INOAC CORPORATION;INOAC TECHNICAL CENTER 发明人 SATO YUKIO
分类号 A47L13/16;B08B1/00;C08G18/10;C08G101/00;C08J9/00;(IPC1-7):B29C44/02 主分类号 A47L13/16
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