发明名称 |
Exposure apparatus, and device manufacturing method |
摘要 |
An exposure apparatus for lithographically transferring a pattern of an original onto a substrate to be exposed includes a first detector for detecting a position of an alignment mark on an exposure shot formed on the substrate, a second detector for detecting a local tilt adjacent to the alignment mark, the position of which is detected by the first detector, and a third detector for detecting a tilt of the exposure shot.
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申请公布号 |
US6654096(B1) |
申请公布日期 |
2003.11.25 |
申请号 |
US20000658462 |
申请日期 |
2000.09.08 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
FUJITA ITARU;TSUKAMOTO IZUMI;NOGAWA HIDEKI;TAKABAYASHI YUKIO |
分类号 |
H01L21/68;G03B27/42;G03F7/22;G03F9/00;G03F9/02;H01L21/027;(IPC1-7):G03B27/68;G03B27/52 |
主分类号 |
H01L21/68 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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