发明名称 CMOS output circuit with enhanced ESD protection using drain side implantation
摘要 A new cascaded NMOS transistor output circuit with enhanced ESD protection is achieved. A driver PMOS transistor has the source connected to a voltage supply, the gate connected to the input signal, and the drain connected to the output pad. A dummy PMOS transistor has the source and the gate connected to the voltage supply, and the drain connected to the output pad. A driver NMOS cascaded stack comprises first and second NMOS transistors. The first NMOS transistor has the source connected to ground and the gate connected to the input signal. The second NMOS transistor has the gate connected to the voltage supply, the source connected to the first NMOS transistor drain, and the drain connected to the output pad. A p- implanted region underlies the n+ region of the drain but does not underlie the n+ region of the source. A dummy NMOS cascaded stack comprises third and fourth NMOS transistors. The third NMOS transistor has the gate and the source connected to ground. The fourth NMOS transistor has the gate connected to the voltage supply, the source connected to the third MOS transistor drain, and the drain connected to the output pad. A p- implanted region underlies the n+ region of the drain but does not underlie the n+ region of the source.
申请公布号 US6653709(B2) 申请公布日期 2003.11.25
申请号 US20020213612 申请日期 2002.08.07
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY 发明人 WU YI-HSU;SU HUNG-DER;LEE JIAN-HSING;LIEW BOON-KHIM
分类号 H01L21/8238;H01L27/02;H01L27/092;(IPC1-7):H01L29/72 主分类号 H01L21/8238
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