发明名称 Exposure apparatus, exposure method, and device manufacturing method
摘要 The apparatus comprises the first air conditioning room which includes the edge surface of the image plane side of the projection optical system and the substrate stage and its driving unit, the second air conditioning room which includes the edge surface of the object surface side of the projection optical system and the mask stage and its driving unit, the third air conditioning room which includes the projection optical system, and the fourth air conditioning room which includes the illumination optical system. It also comprises the first air conditioning control unit, which supplies helium gas of a moderate level to the first and second air conditioning rooms, and the second air conditioning control unit, which supplies helium gas with a high purity level to the third and fourth air conditioning rooms. Accordingly, the first and second air conditioning control units independently control the airflow and the contamination of the respective rooms by using gases for air conditioning corresponding to the performance required. Thus, various ideal controls can be performed independently.
申请公布号 US6654095(B1) 申请公布日期 2003.11.25
申请号 US20000690729 申请日期 2000.10.18
申请人 NIKON CORPORATION 发明人 NISHI KENJI
分类号 G03F7/20;(IPC1-7):G03B27/52;G03B27/42;G03B27/54;A61N5/00;G03C5/00 主分类号 G03F7/20
代理机构 代理人
主权项
地址