| 摘要 |
A method and apparatus for process washing of a process device is provided. The process washing apparatus includes a washing device that moves inside the process device. A washing medium of the washing device is led at least partly inside a body of the washing device in order to lead the washing medium to a target. The washing medium is sprayed to the target by nozzles disposed in the body of the washing device. The apparatus includes first and second supply assemblies for supplying the washing medium to the nozzles. Flow of the washing medium to the first supply assembly is controlled independently of flow of the washing medium to the second supply assembly, and the supply assemblies are capable of moving independently of one another. A method of operating the apparatus including controlling the flow of the washing medium and moving the supply assemblies independently of each other is disclosed.
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