发明名称 |
Chuck for mounting reticle to a reticle stage |
摘要 |
A lithography system for processing a substrate is disclosed. The lithography system includes a stage for moving the substrate relative to a beam. The lithography system further includes a chuck for securely holding the substrate during stage movement. The lithography system additionally includes a support assembly for holding the chuck in a fixed position relative to the stage while accommodating for deformations in either the chuck or the stage during processing so as to precisely locate the substrate relative to the stage and to reduce external stresses that cause substrate distortions.
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申请公布号 |
US6653639(B1) |
申请公布日期 |
2003.11.25 |
申请号 |
US20000691303 |
申请日期 |
2000.10.17 |
申请人 |
NIKON CORPORATION |
发明人 |
NOVAK W. THOMAS |
分类号 |
G03F7/20;G03F7/22;H01J37/305;H01J37/317;H01L21/027;H01L21/68;H01L21/683;(IPC1-7):G01J1/00;G01N21/00;H01J37/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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