| 摘要 |
PROBLEM TO BE SOLVED: To lessen contamination on the back side of a substrate with a treatment liquid in a substrate treatment liquid apparatus. SOLUTION: The treatment liquid coating apparatus is provided with a substrate attraction part 10, a peripheral member 11, a rotating power source, and a treatment liquid supply part. The substrate attraction part 10 is so installed in a rotatable manner as to put a substrate W on the upper face. The peripheral member 11 is positioned in the surrounding of the substrate attraction part 10 while being enabled to rotated synchronously with the substrate attraction part 10 and the upper face being positioned slightly lower than the upper face of the substrate attraction part 10. The rotating power source rotates the substrate part 10 and the peripheral member 11. The treatment liquid supply part supplies a treatment liquid to the substrate W mounted on the substrate attraction part 10. |
