发明名称 HEAT DECOMPOSITION TREATMENT METHOD FOR HALOGEN ATOM- CONTAINING ORGANIC COMPOUND
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a heat decomposition treatment method which can heat- decompose a halogen atom-containing organic compound while minimizing the discharge of a halogen component (particularly chlorine) and benzene to the outside of a system. <P>SOLUTION: In this heat decomposition treatment method for the halogen atom-containing organic compound, the halogen atom-containing organic compound, is heated together with soil to 300 to 600°C in the presence of metal oxide particles and water to eliminate the halogen component from the halogen atom-containing organic compound. The halogen component is captured in a mixture of the soil with the metal oxide particles. The mixture is then melted to fix the halogen component in the melt, and the organic compound, from which the halogen component has been eliminated, is reduced and thermally decomposed. <P>COPYRIGHT: (C)2004,JPO</p>
申请公布号 JP2003334534(A) 申请公布日期 2003.11.25
申请号 JP20020308341 申请日期 2002.10.23
申请人 ISV JAPAN:KK 发明人 YASUFUKU TOSHIAKI;TERADA TAKAHIKO;KIKAWADA KAZUYA
分类号 A62D3/32;A62D3/33;A62D3/34;A62D3/37;A62D3/40;A62D101/04;A62D101/08;A62D101/22;A62D101/28;B09B3/00;B09C1/06;C02F11/10;C07B35/06;C07B37/06;C07C23/12;C07C23/20;C07D319/24;(IPC1-7):B09C1/06;A62D3/00 主分类号 A62D3/32
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