发明名称 Processing apparatus, processing system, distinguishing method, and detecting method
摘要 The temperature of a hot plate is not more than a predetermined threshold when a wafer is accurately mounted at a substrate mounting position on the hot plate, whereas the temperature of the hot plate is the predetermined threshold when the wafer is not accurately mounted at the substrate mounting position on the hot plate. Therefore, when the temperature of the hot plate is not less than the predetermined threshold when the wafer is mounted on the hot plate, it is judged that the wafer is stranded on a guide, and an alarm is given by means of a speaker or a display section.
申请公布号 US6654668(B1) 申请公布日期 2003.11.25
申请号 US20000502580 申请日期 2000.02.11
申请人 TOKYO ELECTRON LIMITED 发明人 HARADA KOJI;NAKAYAMA HISAKAZU;OOKURA JUN
分类号 H01L21/66;G05D23/00;H01L21/00;(IPC1-7):G05D23/00 主分类号 H01L21/66
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