| 摘要 |
PROBLEM TO BE SOLVED: To provide a surface treatment method for a substrate by the irradiation with light, and an apparatus therefor. SOLUTION: In the surface treatment method for the substrate for performing the hydrophilizing treatment of the surface of the substrate and the oxide film forming treatment of the surface of the substrate and/or the selective removing treatment of organic matter bonded to the substrate by the irradiation with light, (1) a container holding the substrate sample is made movable in a system controlled to an arbitrary atmospheric pressure to fluidize the sample, (2) the sample is irradiated with ultraviolet rays during the fluidization of the sample, (3) active oxygen formed in the system by the irradiation with ultraviolet rays is diffused and the reaction formed gas is diffused to the outside of the container and (4) gas for promoting oxidation is arbitrarily introduced into the container. The surface treatment apparatus for the substrate is also disclosed. COPYRIGHT: (C)2004,JPO
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