发明名称 LIQUID JET HEAD, AND MANUFACTURING METHOD FOR CHANNEL FORMATION PLATE THEREFOR
摘要 PROBLEM TO BE SOLVED: To provide a liquid jet head capable of surely removing bubbles which invade a reservoir. SOLUTION: A channel formation substrate 15 consists of a (110) cubic silicon single crystal substrate. Pressure generation chambers 4 and supply paths 2 for a liquid to be jetted are constructed integrally by walls 4a and 2b, by half etching to make a width of the wall 2b for partitioning the supply path 2 larger than a width of the wall 4a for partitioning the pressure generation chamber 4. A leading end 2a of the wall 2b for partitioning the supply path 2 is made close to an end of a wall 3a for partitioning the reservoir 3. Therefore, a negative pressure applied from a nozzle opening is limited by the wall of each supply path 2 and acts concentratedly to bubbles. COPYRIGHT: (C)2004,JPO
申请公布号 JP2003334951(A) 申请公布日期 2003.11.25
申请号 JP20030062969 申请日期 2003.03.10
申请人 SEIKO EPSON CORP 发明人 WANIBE AKIHISA
分类号 B41J2/045;B41J2/055;B41J2/14;B41J2/16;(IPC1-7):B41J2/045 主分类号 B41J2/045
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