PLASMA TREATMENT APPARATUS AND METHOD THEREFOR

摘要

PROBLEM TO BE SOLVED: To produce uniform plasma with high density, by providing an antenna having a plurality of power supply points controlled in their phases.

SOLUTION: There is provided an etching apparatus, capable of producing uniform plasma with high density by introducing high-frequency waves having the electric component perpendicular to the center axis of the apparatus by making use of an antenna, having a plurality of electric power supply points which are phase-controlled. Uniform plasma with high density is formed by preventing the electric field from concentrating in the neighborhood of the central axis of the apparatus.

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