| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a high-throughput particle beam inspection device. <P>SOLUTION: A characteristic frequency in correspondence with focal deviation volume is found from Fourier spectrum of a sample image by a focal deviation computing unit 60 in a particle beam length measurement device, an out-of-focus beam distribution function in accordance with the characteristic frequency is generated by a beam distribution generator 61, a component of the out-of- focus beam distribution function is removed from the sample image recorded by a one-dimensional image memory 71 by a deconvolution computing unit 51, and a size measurement of the sample image obtained is made by a length measurement computing unit 72. With this, a focusing time by particle beam scanning can be saved, which has an effect of saving an inspection time for sizes or appearance defects of semiconductor elements or the like. <P>COPYRIGHT: (C)2004,JPO</p> |
