发明名称 LIGHT ABSORBING POLYMER FOR FORMING ORGANIC ANTI-REFLECTIVE COATING, COMPOSITION INCLUDING THE SAME, AND METHOD FOR FORMING SEMICONDUCTOR DEVICE PATTERN USING THE SAME
摘要 PURPOSE: A light absorbing polymer for forming an organic anti-reflective coating, a composition including the same, and a method for forming a semiconductor device pattern using the same are provided to be capable of forming a vertical structure pattern and improving the uniformity of the vertical structure pattern. CONSTITUTION: A light absorbing polymer for forming an organic anti-reflective coating includes an acrylamide monomer as a light absorbing monomer. Preferably, the composition for forming the organic anti-reflective coating, contains the light absorbing polymer, a crosslink agent capable of forming a layer by using a crosslink reaction, a catalyst for promoting the crosslink reaction, and an organic solvent.
申请公布号 KR20030089171(A) 申请公布日期 2003.11.21
申请号 KR20020027254 申请日期 2002.05.17
申请人 MOLAY CO., LTD. 发明人 LEE, GWAN GU
分类号 G03F7/09;(IPC1-7):H01L21/027 主分类号 G03F7/09
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