发明名称 |
LITHOGRAPHIC SYSTEM, METHOD OF MANUFACTURING DEVICE, METHOD OF MEASURING PERFORMANCE, METHOD FOR CALIBRATION, AND COMPUTER PROGRAM |
摘要 |
PROBLEM TO BE SOLVED: To provide a controller system for pulse radiation source that uses a lowest-order, preferably, first-order closed loop controller and performs dead beat control. SOLUTION: The performance index of a lithographic system with respect to a pulse radiation source is based on the moving average MA and moving standard deviation MSD of the error of actual pulse energy from target pulse energy. A normalized index is given by the equation (12) in which Ep<SB>ref</SB>(i) and Ep<SB>err</SB>(i) respectively denote the reference energy per pulse and energy error per pulse with respect to a point i and expressed by the formula (13). COPYRIGHT: (C)2004,JPO
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申请公布号 |
JP2003332233(A) |
申请公布日期 |
2003.11.21 |
申请号 |
JP20030130517 |
申请日期 |
2003.05.08 |
申请人 |
ASML NETHERLANDS BV |
发明人 |
HEINTZE JOHANNES |
分类号 |
G03F7/20;H01L21/027;H01S3/134;H01S3/225;(IPC1-7):H01L21/027 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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