发明名称 LITHOGRAPHIC SYSTEM, METHOD OF MANUFACTURING DEVICE, METHOD OF MEASURING PERFORMANCE, METHOD FOR CALIBRATION, AND COMPUTER PROGRAM
摘要 PROBLEM TO BE SOLVED: To provide a controller system for pulse radiation source that uses a lowest-order, preferably, first-order closed loop controller and performs dead beat control. SOLUTION: The performance index of a lithographic system with respect to a pulse radiation source is based on the moving average MA and moving standard deviation MSD of the error of actual pulse energy from target pulse energy. A normalized index is given by the equation (12) in which Ep<SB>ref</SB>(i) and Ep<SB>err</SB>(i) respectively denote the reference energy per pulse and energy error per pulse with respect to a point i and expressed by the formula (13). COPYRIGHT: (C)2004,JPO
申请公布号 JP2003332233(A) 申请公布日期 2003.11.21
申请号 JP20030130517 申请日期 2003.05.08
申请人 ASML NETHERLANDS BV 发明人 HEINTZE JOHANNES
分类号 G03F7/20;H01L21/027;H01S3/134;H01S3/225;(IPC1-7):H01L21/027 主分类号 G03F7/20
代理机构 代理人
主权项
地址