发明名称 METHOD FOR FORMING LONG WAVELENGTH INDIUM/GALLIUM/ ARSENIC NITRIDE (InGaAsN) ACTIVE REGION
摘要 PROBLEM TO BE SOLVED: To provide a method for mass producing a high optical quality light emitting element having an InGaAsN active layer economically by OMVPE. SOLUTION: A method for manufacturing a long wavelength light emitting element (100) comprises steps for arranging a substrate (220) supporting an InGaAsN film in an OMVPE reaction furnace (210), supplying a group III-V precursor substance mixture (214) containing arsine, dimethylhydrazine, alkyl gallium, alkyl indium and carrier gas where arsine and dimethylhydrazine are group V precursor substance materials and the percentage of dimethylhydrazine is substantially higher than the percentage of arsine to the reaction furnace, and applying such a pressure as a nitrogen concentration causing the emission of light having a wavelength longer than 1.2 μm is extracted from dimethylhydrazine and formed on a substrate to the reaction furnace (210). COPYRIGHT: (C)2004,JPO
申请公布号 JP2003332696(A) 申请公布日期 2003.11.21
申请号 JP20030129259 申请日期 2003.05.07
申请人 AGILENT TECHNOL INC 发明人 BOUR DAVID P;TAKEUCHI TETSUYA;TANDON ASHISH;CHANG YING-LAN;TAN MICHAEL R T;CORZINE SCOTT
分类号 C30B25/02;H01L21/205;H01L33/00;H01L33/10;H01S5/323;H01S5/343;(IPC1-7):H01S5/343 主分类号 C30B25/02
代理机构 代理人
主权项
地址