| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a semiconductor device which assures a higher driving performance of transistor in the peripheral circuit region. <P>SOLUTION: The peripheral circuit region 63 comprises second semiconductor regions 9 formed on a semiconductor substrate 50, a second gate insulation film 12 which is formed thinner thin a first gate insulation film 13, a second gate electrode 15 formed on the second gate insulation film 12, and source and drain regions 31, doped with an impurity of the first conductivity type, formed in the second semiconductor regions 9 in both sides of the second gate electrode 15. The source and drain regions 31 include a p-type low concentration impurity region 29 contain relatively low impurity concentration of the first conductivity type and a p-type high concentration impurity region 30 containing relatively high p-type impurity concentration. <P>COPYRIGHT: (C)2004,JPO |
