| 摘要 |
PROBLEM TO BE SOLVED: To provide a structure for preventing a product, which is generated by reactive gas, from being accumulated on a sensor used in a process such as a semiconductor manufacturing process of applying reaction product gas, and preventing a contact made by a detection part of the sensor with the reactive gas from causing corrosion. SOLUTION: For the sensor for measuring a pressure and so on of a vacuum system device and equipment for applying reactive gas, a passage is provided between the sensor and a space chamber filled with the reactive gas, and a means for applying inert gas through the passage. A flow channel is formed which connects the sensor and the space chamber filled with reactive gas and inert gas is applied through the flow channel to generate a flow of the inert gas from the sensor to the space chamber filled with the reactive gas, so that it is possible to prevent the reactive gas from flowing into the sensor. Thus, it is possible to prevent the detection part of the sensor from making contact with the reactive gas and causing corrosion and prevent the product, which is generated by the reactive gas, from adhering to the detection part of the sensor. COPYRIGHT: (C)2004,JPO
|
