| 摘要 |
PROBLEM TO BE SOLVED: To stably draw snaking continuous grooves or a pit column with small pitches by compensating a proximity effect caused by adjoining pattern exposure with a simple constitution, when the snaking continuous grooves or the pit column are formed at a constant period, with one electron beam in a continuous exposure mode of only one time. SOLUTION: An aperture 13 that performs beam shaping for an electron beam comprises: an mechanism part 14 with variable aperture that continuously varies an area of an aperture part 22 through which the electron beam passes; and a part 15 for varying the area of aperture that controls the degree of opening of the mechanism part 14. A pattern generator 31 sends an aperture area control signal, corresponding to a pattern to be drawn, to the part 15, to vary the degree of opening of the mechanism part 14. Thereby a diameter of the electron beam is controlled. COPYRIGHT: (C)2004,JPO
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