| 发明名称 |
PHOTOSENSITIVE COMPOSITION, POLYMER STRUCTURE, AND PATTERN FORMING METHOD |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive composition which is capable of forming a pattern with a comparatively small exposure without a developing process. <P>SOLUTION: The photosensitive composition includes a photosensitive polymer compound having an azobenzene skeleton and nano-particles. <P>COPYRIGHT: (C)2004,JPO |
| 申请公布号 |
JP2003332199(A) |
申请公布日期 |
2003.11.21 |
| 申请号 |
JP20020134313 |
申请日期 |
2002.05.09 |
| 申请人 |
INST OF PHYSICAL & CHEMICAL RES;RIKOGAKU SHINKOKAI;MITSUBISHI CHEMICALS CORP |
发明人 |
UBUKATA TAKASHI;HARA MASAHIKO;SEKI TAKAHIRO;ASAMI HARUHIRO;KAMIYA ITARU |
| 分类号 |
G03F7/004;B82B1/00;G02B5/18;H01L21/027 |
主分类号 |
G03F7/004 |
| 代理机构 |
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