发明名称 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a semiconductor device which can eliminate such problems as a reduction in workability, an increase in cost, or the like, caused by two-step resin sealing including underfill sealing and overcoat sealing. <P>SOLUTION: The resin sealing seals a surface of a semiconductor chip and a space between the semiconductor chip and an interposer using a single liquid resin as a sealing resin. First, the resin is coated collectively at a time under the atmospheric pressure by a printing method, a potting method, or the like. Then, voids entrained during the coating process and voids confined in the space between the semiconductor chip and the interposer are removed under a negative pressure. Thereafter, the resin is hardened at a high temperature. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2003332494(A) 申请公布日期 2003.11.21
申请号 JP20020138528 申请日期 2002.05.14
申请人 NEW JAPAN RADIO CO LTD 发明人 KURATA HIROYUKI;KARASAWA YOSHIMITSU
分类号 H01L23/12;H01L21/56;H01L21/60 主分类号 H01L23/12
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