发明名称 METHOD FOR FORMING RESIN LAYER
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method for forming a resin layer in which a substrate with a deposition film, e.g. a photovoltaic element substrate, exhibiting excellent durability even in a severe outdoor environment can be obtained by an inexpensive and convenient method. <P>SOLUTION: The method for forming a resin layer comprises a step for applying and drying a resin layer material 202 to the substrate 100 with a deposition film having a part 107 inclining reversely relative to a deposition film mounting faced at one end part, and a step for holding an inclining part 107 at the lowermost position of the substrate 100 with the deposition film. <P>COPYRIGHT: (C)2004,JPO</p>
申请公布号 JP2003332596(A) 申请公布日期 2003.11.21
申请号 JP20020133436 申请日期 2002.05.09
申请人 CANON INC 发明人 SHIOZUKA HIDENORI;KATAOKA ICHIRO;TAKABAYASHI MEIJI;MIMURA TOSHIHIKO
分类号 H01L31/04;(IPC1-7):H01L31/04 主分类号 H01L31/04
代理机构 代理人
主权项
地址