| 摘要 |
PROBLEM TO BE SOLVED: To provide a liquid treatment apparatus and a liquid treatment method for suppressing occurrence of nonuniformity in liquid treatment. SOLUTION: An irrigation treatment apparatus 1 has: a rotary plate 61; a motor 66 for rotating the rotary plate 61; a supporting pin 64a for supporting a wafer W; a holding pin 64b for holding the wafer W; and a liquid medicine feeding nozzle 51 for feeding an irrigation liquid to the wafer W. The holding pin 64b has: a holding member 85 which is freely rotated around a perpendicular pivot 86 to change its form holding the wafer W with the rotation around the pivot 86; a position adjusting mechanism 110 for positioning the holding member 85; and a lock mechanism 88 for locking the pivot 86. In accordance with the number of rotations of the wafer W, the form of the holding member 85 holding the wafer W is changed to suppress the occurrence of treatment nonuniformity. COPYRIGHT: (C)2004,JPO |
