| 摘要 |
<p>Plasma control methods and apparatus are provided that use at least one phase or frequency controlled radiation source. A plasma apparatus, for example, can include a first radiation source (26), controlled by a first signal, configured to direct radiation into a radiation cavity (12) to form a plasma. The plasma apparatuscan also include a phase shifter (308) for shifting a phase of the signal to generate a phase-shifted signal. A second radiation source (27) can be controlled by the phase shifted signal, and configured to direct additional radiation into the cavity (12). The frequency of one or more of the radiation sources can also be varied or shifted. Various types of plasma catalysts are also provided.</p> |
