发明名称 |
Polymers, resist compositions and patterning process |
摘要 |
A resist composition comprising a base polymer having sulfone or sulfonate units introduced therein is sensitive to high-energy radiation below 300 nm, is endowed with excellent adherence to substrates while maintaining transparency, and is suited for lithographic microprocessing.
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申请公布号 |
US2003215740(A1) |
申请公布日期 |
2003.11.20 |
申请号 |
US20030396556 |
申请日期 |
2003.03.26 |
申请人 |
HARADA YUJI;HATAKEYAMA JUN;SASAGO MASARU;ENDO MASAYUKI;KISHIMURA SHINJI |
发明人 |
HARADA YUJI;HATAKEYAMA JUN;SASAGO MASARU;ENDO MASAYUKI;KISHIMURA SHINJI |
分类号 |
C08F220/18;C08F222/06;C08F228/02;C08F232/08;G03F7/039;(IPC1-7):G03F7/039;G03F7/26;G03F7/004 |
主分类号 |
C08F220/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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